We have two Oxford Instruments ICP etchers. We can etch several semiconductor materials using Fluorine or Chlorine chemistries:
a) ICP F (SF6, C4F8, O2, Ar, CHF3, CF4)
b) ICP Cl(BCl3, Cl2, SF6, O2, Ar, C4F8, CHF3)
Tool Owner: J. Aguilera (ICP-Cl), R. Previdi (ICP-F)